Date published: 2026-4-4

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Tetrakis(dimethylamino)titanium (CAS 3275-24-9)

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Alternate Names:
TDMAT; Tetrakis(dimethylamino)titanium(IV)
CAS Number:
3275-24-9
Molecular Weight:
224.17
Molecular Formula:
C8H24N4Ti
For Research Use Only. Not Intended for Diagnostic or Therapeutic Use.
Available in US only.
* Refer to Certificate of Analysis for lot specific data.

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Tetrakis(dimethylamino)titanium functions as a titanium source in the synthesis of various titanium-containing materials. Tetrakis(dimethylamino)titanium′s mechanism of action involves its ability to undergo thermal decomposition, releasing dimethylamine and forming titanium dioxide films on substrates. Tetrakis(dimethylamino)titanium plays a role in the production of thin films for applications such as photovoltaic devices, sensors, and optical coatings. Tetrakis(dimethylamino)titanium serves as a titanium precursor, contributing to the development of advanced materials with tailored properties. Its mechanism of action involves its chemical reactivity and decomposition behavior, enabling the deposition of titanium dioxide films with controlled thickness and composition.


Tetrakis(dimethylamino)titanium (CAS 3275-24-9) References

  1. Titanium and zirconium complexes of a phosphorus-containing p-tert-butylcalix[5]arene ligand: importance of metal and conformation on ligand/metal binding.  |  Fan, M., et al. 2006. Inorg Chem. 45: 6490-6. PMID: 16878963
  2. Titanium dioxide thin films deposited by plasma enhanced atomic layer deposition for OLED passivation.  |  Kim, WS., et al. 2008. J Nanosci Nanotechnol. 8: 4726-9. PMID: 19049095
  3. Improved oxygen diffusion barrier properties of ruthenium-titanium nitride thin films prepared by plasma-enhanced atomic layer deposition.  |  Jeong, SJ., et al. 2011. J Nanosci Nanotechnol. 11: 671-4. PMID: 21446521
  4. Synthesis of uniformly dispersed anatase nanoparticles inside mesoporous silica thin films via controlled breakup and crystallization of amorphous TiO2 deposited using atomic layer deposition.  |  Sree, SP., et al. 2013. Nanoscale. 5: 5001-8. PMID: 23636429
  5. Indium diffusion and native oxide removal during the atomic layer deposition (ALD) of TiO2 films on InAs(100) surfaces.  |  Ye, L. and Gougousi, T. 2013. ACS Appl Mater Interfaces. 5: 8081-7. PMID: 23895423
  6. Fluidized-bed atomic layer deposition reactor for the synthesis of core-shell nanoparticles.  |  Didden, AP., et al. 2014. Rev Sci Instrum. 85: 013905. PMID: 24517780
  7. Structure and photoluminescence of the TiO2 films grown by atomic layer deposition using tetrakis-dimethylamino titanium and ozone.  |  Jin, C., et al. 2015. Nanoscale Res Lett. 10: 95. PMID: 25852391
  8. Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes.  |  Kimes, WA., et al. 2015. J Res Natl Inst Stand Technol. 120: 58-63. PMID: 26958438
  9. Formation of atomically ordered and chemically selective Si-O-Ti monolayer on Si0.5Ge0.5(110) for a MIS structure via H2O2(g) functionalization.  |  Park, SW., et al. 2017. J Chem Phys. 146: 052808. PMID: 28178814
  10. Data set for fabrication of conformal two-dimensional TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H2O precursors.  |  Zhuiykov, S., et al. 2017. Data Brief. 13: 401-407. PMID: 28664177
  11. Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy.  |  Vandenbroucke, SST., et al. 2020. Phys Chem Chem Phys. 22: 9262-9271. PMID: 32307490
  12. Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl4) Precursor.  |  Lee, WJ., et al. 2020. Data Brief. 31: 105777. PMID: 32551348
  13. Schottky-type GaN-based UV photodetector with atomic-layer-deposited TiN thin film as electrodes.  |  Su, L., et al. 2022. Opt Lett. 47: 429-432. PMID: 35030621
  14. Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor.  |  Tezsevin, I., et al. 2023. Langmuir. 39: 4265-4273. PMID: 36921108

Ordering Information

Product NameCatalog #UNITPriceQtyFAVORITES

Tetrakis(dimethylamino)titanium, 5 g

sc-272579
5 g
$244.00
US: Only available in the US

Tetrakis(dimethylamino)titanium, 25 g

sc-272579A
25 g
$726.00
US: Only available in the US

Tetrakis(dimethylamino)titanium, 100 g

sc-272579B
100 g
$2876.00
US: Only available in the US

Tetrakis(dimethylamino)titanium, 1 kg

sc-272579C
1 kg
$27050.00
US: Only available in the US