Tetrakis(diethylamino)zirconium (CAS 13801-49-5)
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Tetrakis(diethylamino)zirconium is a chemical primarily investigated for its applications in materials science, particularly within the area of atomic layer deposition (ALD) processes. This compound acts as a zirconium precursor, enabling the precise deposition of zirconium-containing thin films that are integral to semiconductor device manufacturing. Its reactivity under controlled conditions allows for the study of surface chemistry and thin-film growth kinetics, critical for improving electronic component performance. Chemists often employ this compound in the synthesis of zirconium-based ceramics and catalysts, exploring the influence of its ligands on the resultant material properties. Additionally, its utility in producing metal-organic frameworks (MOFs) is of significant interest due to the potential these structures have for gas storage and separation applications.
Tetrakis(diethylamino)zirconium (CAS 13801-49-5) References
- Titanium and zirconium complexes of a phosphorus-containing p-tert-butylcalix[5]arene ligand: importance of metal and conformation on ligand/metal binding. | Fan, M., et al. 2006. Inorg Chem. 45: 6490-6. PMID: 16878963
- Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water. | Xu, R., et al. 2022. Front Chem. 10: 1035902. PMID: 36405315
- Resolving the Heat Generated from ZrO2 Atomic Layer Deposition Surface Reactions. | Bielinski, AR., et al. 2023. Angew Chem Int Ed Engl. e202301843. PMID: 37316957
- Stabilization of a very high-k crystalline ZrO2 phase by post deposition annealing of atomic layer deposited ZrO2/La2O3 dielectrics on germanium | S. Abermann, C. Henkel, O. Bethge, G. Pozzovivo, P. Klang, E. Bertagnolli. 2010. Applied Surface Science. 256: 5031-5034.
Ordering Information
| Product Name | Catalog # | UNIT | Price | Qty | FAVORITES | |
Tetrakis(diethylamino)zirconium, 5 g | sc-272578 | 5 g | $86.00 |