Date published: 2026-4-5

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Tantalum(V) ethoxide (CAS 6074-84-6)

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CAS Number:
6074-84-6
Molecular Weight:
406.25
Molecular Formula:
C10H25O5Ta
Supplemental Information:
This is classified as a Dangerous Good for transport and may be subject to additional shipping charges.
For Research Use Only. Not Intended for Diagnostic or Therapeutic Use.
* Refer to Certificate of Analysis for lot specific data.

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Tantalum(V) ethoxide is a chemical compound primarily utilized in the field of materials science for the deposition of tantalum oxide films, which are of interest due to their high dielectric constant and stability. These properties make the films suitable for use in electronic devices as insulating layers or as a part of the capacitors. Additionally, tantalum(V) ethoxide is used as a precursor in sol-gel processes, where it undergoes hydrolysis and polycondensation reactions to form tantalum oxide-based materials at low temperatures. The compound is also instrumental in the synthesis of metal-organic frameworks (MOFs) that incorporate tantalum, as well as in the production of nanoparticles and other nanostructured materials. Researchers study the use of tantalum(V) ethoxide to create coatings with anti-corrosive or catalytic properties, expanding the potential applications of tantalum-based materials. In the realm of chemical synthesis, this compound is employed to introduce tantalum into complex molecular structures, exploring the chemistry of tantalum in various coordination environments.


Tantalum(V) ethoxide (CAS 6074-84-6) References

  1. Multifunctional Fe3O4/TaO(x) core/shell nanoparticles for simultaneous magnetic resonance imaging and X-ray computed tomography.  |  Lee, N., et al. 2012. J Am Chem Soc. 134: 10309-12. PMID: 22676237
  2. Novel hierarchical tantalum oxide-PDMS hybrid coating for medical implants: One pot synthesis, characterization and modulation of fibroblast proliferation.  |  Tran, PA., et al. 2017. J Colloid Interface Sci. 485: 106-115. PMID: 27662021
  3. Ordered gyroidal tantalum oxide photocatalysts: eliminating diffusion limitations and tuning surface barriers.  |  Cherevan, AS., et al. 2016. Nanoscale. 8: 16694-16701. PMID: 27714100
  4. Surfactant-free tantalum oxide nanoparticles: synthesis, colloidal properties, and application as a contrast agent for computed tomography.  |  Koshevaya, E., et al. 2020. J Mater Chem B. 8: 8337-8345. PMID: 32794534
  5. Metallorganic chemical vapor deposition of Ta2O5 films  |  A Porporati, S Roitti, O Sbaizero. 2003. Journal of the European Ceramic Society. 23: 247-251.
  6. Site-selective deposition and micropatterning of tantalum oxide thin films using a monolayer  |  Yoshitake Masuda, Shinichi Wakamatsu, Kunihito Koumoto. 2004. Journal of the European Ceramic Society. 24: 301-307.
  7. Selective oxidation of a pyrimidine thioether using supported tantalum catalysts  |  V. Cimpeanu a, V. Pârvulescu b, V.I. Pârvulescu b, M. Capron c, P. Grange c, J.M. Thompson d, C. Hardacre d. 2005. Journal of Catalysis. 235: 184-194.
  8. Preparation of high-purity tantalum ethoxide by vacuum distillation  |  Sheng-hai YANG a, Yong-ming CHEN a, Hai-ping YANG a, Yin-yuan LIU a, Mo-tang TANG a, Guan-zhou QIU b. 2008. Transactions of Nonferrous Metals Society of China. 18: 196-201.
  9. Tantalum(V) or niobium(V) catalyzed oxidation of sulfides with 30% hydrogen peroxide  |  Masayuki Kirihara a, Junya Yamamoto a, Takuya Noguchi a b, Atsushi Itou a, Sayuri Naito a, Yoshiro Hirai b. 2009. Tetrahedron. 65: 10477-10484.
  10. Doped microporous hybrid silica membranes for gas separation  |  Hammad F. Qureshi, Rogier Besselink, Johan E. ten Elshof, Arian Nijmeijer & Louis Winnubst. 2015. Journal of Sol-Gel Science and Technology. 75: 180–188.
  11. Synthesis and structural characterization of two complex tantalum(V) siloxides  |  Sophie Ehle, Volker Lorenz, Phil Liebing, Liane Hilfert, Frank T. Edelmann. 2016. Inorganic Chemistry Communications. 74: 82-85.
  12. Fabrication of Tantalum and Hafnium Carbide Fibers via ForcespinningTM for Ultrahigh-Temperature Applications  |  Harold O. Lee,1Patricia H. Caraballa,2Avi G. Bregman,1Nelson S. Bell,1James R. Nicholas,1Marissa Ringgold,1and LaRico J. Treadwell. 2021. Advances in Materials Science and Engineering. 2021.
  13. Fabrication of tantalum oxyfluoride and oxynitride thin films via ammonolysis of sol–gel processed tetraethoxo (β-diketonato) tantalum (V) precursors for enhanced photocatalytic activity  |  Mohd. Danish, Ashutosh Pandey, Aftab Aslam Parwaz Khan & Abdullah M. Asiri. 2021. Journal of Materials Science: Materials in Electronics. 32: 10564–10578.

Ordering Information

Product NameCatalog #UNITPriceQtyFAVORITES

Tantalum(V) ethoxide, 10 g

sc-251102
10 g
$125.00