Items 11 to 20 of 381 total
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Product Name | CAS # | Catalog # | QUANTITY | Price | Citations | RATING |
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1,3-Dicyclohexyl-1,1,3,3-tetrakis(dimethylvinylsilyloxy)disiloxane | 302912-37-4 | sc-222961 | 1 g | $83.00 | ||
1,3-Dicyclohexyl-1,1,3,3-tetrakis(dimethylvinylsilyloxy)disiloxane is a distinctive silicon compound featuring a complex siloxane backbone with multiple vinylsilyloxy groups. This structure promotes unique steric effects and enhances the compound's reactivity in polymerization processes. Its ability to form robust siloxane linkages allows for tailored material properties, while the cyclohexyl groups contribute to its hydrophobic characteristics, influencing solubility and compatibility in various formulations. | ||||||
1,3-Bis(3-glycidyloxypropyl)tetramethyldisiloxane | 126-80-7 | sc-222919 | 100 ml | $238.00 | ||
1,3-Bis(3-glycidyloxypropyl)tetramethyldisiloxane is a versatile silicon compound characterized by its unique glycidyl ether functionality. This structure facilitates significant cross-linking potential, enhancing the formation of durable networks in polymer matrices. The presence of siloxane linkages imparts flexibility and thermal stability, while the glycidyl groups enable reactive interactions with various substrates, promoting adhesion and compatibility in diverse applications. | ||||||
Chlorotripropylsilane | 995-25-5 | sc-239539 | 5 g | $35.00 | ||
Chlorotripropylsilane is a silicon compound distinguished by its chlorinated propyl groups, which enhance its reactivity in nucleophilic substitution reactions. This compound exhibits unique surface modification properties, allowing for the functionalization of silica and other substrates. Its ability to form siloxane bonds contributes to the development of robust silane coupling agents, promoting adhesion and improving the mechanical properties of composite materials. | ||||||
(3-Mercaptopropyl)trimethoxysilane | 4420-74-0 | sc-231786 | 25 g | $30.00 | ||
(3-Mercaptopropyl)trimethoxysilane is a versatile silicon compound characterized by its thiol functional group, which facilitates strong interactions with metal surfaces and enhances adhesion properties. Its trimethoxy groups enable efficient hydrolysis, leading to the formation of silanol species that can engage in condensation reactions. This compound's unique reactivity allows for the creation of cross-linked networks, improving the durability and stability of various materials. | ||||||
(3-Chloropropyl)triethoxysilane | 5089-70-3 | sc-231648 | 100 ml | $33.00 | ||
(3-Chloropropyl)triethoxysilane is a silicon compound distinguished by its chloropropyl group, which promotes nucleophilic substitution reactions, enhancing its reactivity with various substrates. The triethoxy groups facilitate rapid hydrolysis, generating silanol groups that can form siloxane bonds. This compound exhibits unique surface modification capabilities, allowing for tailored interactions with organic and inorganic materials, thereby influencing adhesion and compatibility in composite systems. | ||||||
(3-Aminopropyl)dimethylmethoxysilane | 31024-26-7 | sc-281662 | 5 g | $139.00 | ||
(3-Aminopropyl)dimethylmethoxysilane is a silicon compound characterized by its amino group, which enhances its ability to engage in hydrogen bonding and electrostatic interactions. The dimethylmethoxy groups contribute to its hydrophobic nature while allowing for selective reactivity with moisture, promoting silanol formation upon hydrolysis. This compound's unique structure enables effective surface functionalization, improving adhesion properties and compatibility with various substrates in diverse applications. | ||||||
Bis(methylthio)(trimethylsilyl)methane | 37891-79-5 | sc-293517 | 1 g | $290.00 | ||
Bis(methylthio)(trimethylsilyl)methane is a silicon compound notable for its unique sulfur-containing groups, which facilitate distinctive molecular interactions through thiol-based reactivity. The trimethylsilyl moieties enhance its stability and hydrophobic characteristics, allowing for selective reactivity in various chemical environments. This compound exhibits interesting reaction kinetics, particularly in nucleophilic substitution reactions, making it a versatile building block in silicon chemistry. | ||||||
(3-Bromopropyl)trimethoxysilane | 51826-90-5 | sc-231559 | 5 ml | $228.00 | ||
(3-Bromopropyl)trimethoxysilane is a silicon compound characterized by its bromopropyl group, which introduces unique reactivity through halogen interactions. The presence of trimethoxysilane enhances its ability to form siloxane bonds, promoting adhesion to various substrates. This compound exhibits significant hydrolytic stability, allowing for controlled release of the bromine atom in nucleophilic substitution reactions, thus facilitating diverse pathways in silicon-based synthesis. | ||||||
Di-tert-butylsilyl bis(trifluoromethanesulfonate) | 85272-31-7 | sc-252677A sc-252677 sc-252677B | 1 g 5 g 25 g | $50.00 $100.00 $390.00 | ||
Di-tert-butylsilyl bis(trifluoromethanesulfonate) is a silicon compound notable for its robust trifluoromethanesulfonate groups, which enhance electrophilic reactivity. This compound exhibits unique molecular interactions, facilitating the formation of stable siloxane linkages. Its sterically hindered tert-butyl groups contribute to selective reactivity, allowing for controlled pathways in silicon chemistry. The compound's high stability under various conditions makes it an intriguing candidate for advanced synthetic applications. | ||||||
1H,1H,2H,2H-Perfluorododecyltrichlorosilane | 102488-49-3 | sc-259054 sc-259054A | 1 g 5 g | $98.00 $406.00 | ||
1H,1H,2H,2H-Perfluorododecyltrichlorosilane is a silicon compound characterized by its perfluorinated alkyl chain, which imparts exceptional hydrophobicity and low surface energy. This unique structure promotes strong molecular interactions with various substrates, enhancing adhesion properties. The presence of trichlorosilane groups facilitates rapid hydrolysis, leading to the formation of silanol species that can engage in further condensation reactions, making it a versatile agent in surface modification processes. |